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Pushing the Limit of Power Density in Devices with Ultra-Wide Bandgap (All-AlGaN) Heterostructures.
Pushing the Limit of Power Density in Devices with Ultra-Wide Bandgap (All-AlGaN) Heterostructures.
- 자료유형
- 학위논문
- Control Number
- 0017164893
- International Standard Book Number
- 9798346380771
- Dewey Decimal Classification Number
- 620
- Main Entry-Personal Name
- Noshin, Maliha.
- Publication, Distribution, etc. (Imprint
- [S.l.] : Stanford University., 2024
- Publication, Distribution, etc. (Imprint
- Ann Arbor : ProQuest Dissertations & Theses, 2024
- Physical Description
- 112 p.
- General Note
- Source: Dissertations Abstracts International, Volume: 86-05, Section: A.
- General Note
- Advisor: Chowdhury, Srabanti.
- Dissertation Note
- Thesis (Ph.D.)--Stanford University, 2024.
- Summary, Etc.
- 요약The increasing energy-consumption due to increased electrification of our society is pushing the limit of today's power-electronics systems. To address this challenge, the development of higher energy-density power-electronic devices and systems will be a key enabler of energy technologies for future grid-electronics and data centers. To this end, ultrawide-bandgap (UWBG) semiconducting materials-like aluminum gallium nitride (AlGaN) are emerging as promising candidates for high-power electronics, beyond the limitations of conventional materials like silicon.In this thesis, I will present the first demonstration of nitrogen (N)-polar AlGaN (Al = 20% to 73%) heterostructure based high-electron mobility transistors. First, I will discuss the compositional design space and metal organic chemical vapor deposition (MOCVD)-growth of such heterostructures to realize a tunable and large bandgap, followed by the materials characterization. I will simultaneously explain how the alloy-dominated scattering of charge carriers in such material system can control its two-dimensional electron gas mobility. Leveraging these fundamental understanding, I will demonstrate the realization of the first N-polar AlGaN-channel high electron mobility transistors, achieving simultaneously large drive current, low contact resistance, low leakage current and large breakdown voltage. Finally, I will illustrate the interface-driven thermal and electrical transport and their temperature dependence in such heterostructures, offering important insights into material-device codesign, electronic device functionality and reliability. This work demonstrates the outstanding potential of AlGaN-based heterostructures for high-power density electronic devices and systems.
- Subject Added Entry-Topical Term
- Silicon.
- Subject Added Entry-Topical Term
- Electrons.
- Subject Added Entry-Topical Term
- Optimization techniques.
- Subject Added Entry-Topical Term
- Electric fields.
- Subject Added Entry-Topical Term
- Electric vehicles.
- Subject Added Entry-Topical Term
- Signal processing.
- Subject Added Entry-Topical Term
- Microscopy.
- Subject Added Entry-Topical Term
- Etching.
- Subject Added Entry-Topical Term
- Aluminum.
- Subject Added Entry-Topical Term
- Transistors.
- Subject Added Entry-Topical Term
- Heat conductivity.
- Subject Added Entry-Topical Term
- Nitrogen.
- Subject Added Entry-Topical Term
- Atomic physics.
- Subject Added Entry-Topical Term
- Electrical engineering.
- Subject Added Entry-Topical Term
- Electromagnetics.
- Subject Added Entry-Topical Term
- Thermodynamics.
- Subject Added Entry-Topical Term
- Transportation.
- Added Entry-Corporate Name
- Stanford University.
- Host Item Entry
- Dissertations Abstracts International. 86-05A.
- Electronic Location and Access
- 로그인을 한후 보실 수 있는 자료입니다.
- Control Number
- joongbu:655947
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