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Multiscale Computational Fluid Dynamics Modeling of Thermal and Plasma Atomic Layer Deposition: Application to Chamber Design and Process Control.
Multiscale Computational Fluid Dynamics Modeling of Thermal and Plasma Atomic Layer Deposi...
Contents Info
Multiscale Computational Fluid Dynamics Modeling of Thermal and Plasma Atomic Layer Deposition: Application to Chamber Design and Process Control.
Material Type  
 학위논문
 
0016052491
Date and Time of Latest Transaction  
20220210093300
ISBN  
9798516062063
DDC  
660
Author  
Zhang, Yichi.
Title/Author  
Multiscale Computational Fluid Dynamics Modeling of Thermal and Plasma Atomic Layer Deposition: Application to Chamber Design and Process Control.
Publish Info  
[S.l.] : University of California, Los Angeles., 2021
Publish Info  
Ann Arbor : ProQuest Dissertations & Theses, 2021
Material Info  
152 p.
General Note  
Source: Dissertations Abstracts International, Volume: 82-12, Section: B.
General Note  
Advisor: Christofides, Panagiotis D.
학위논문주기  
Thesis (Ph.D.)--University of California, Los Angeles, 2021.
Restrictions on Access Note  
This item must not be sold to any third party vendors.
Subject Added Entry-Topical Term  
Chemical engineering.
Subject Added Entry-Topical Term  
Fluid mechanics.
Index Term-Uncontrolled  
Atomic layer deposition
Index Term-Uncontrolled  
Computational fluid dynamics
Index Term-Uncontrolled  
Control
Index Term-Uncontrolled  
Kinetic Monte Carlo
Index Term-Uncontrolled  
Machine learning
Index Term-Uncontrolled  
Plasma enhanced atomic layer deposition
Added Entry-Corporate Name  
University of California, Los Angeles Chemical Engineering 0294
Host Item Entry  
Dissertations Abstracts International. 82-12B.
Host Item Entry  
Dissertation Abstract International
Electronic Location and Access  
로그인을 한후 보실 수 있는 자료입니다.
소장사항  
202202 2022
Control Number  
joongbu:612839
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