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Multiscale Computational Fluid Dynamics Modeling of Thermal and Plasma Atomic Layer Deposition: Application to Chamber Design and Process Control.
Multiscale Computational Fluid Dynamics Modeling of Thermal and Plasma Atomic Layer Deposition: Application to Chamber Design and Process Control.
- Material Type
- 학위논문
- 0016052491
- Date and Time of Latest Transaction
- 20220210093300
- ISBN
- 9798516062063
- DDC
- 660
- Author
- Zhang, Yichi.
- Title/Author
- Multiscale Computational Fluid Dynamics Modeling of Thermal and Plasma Atomic Layer Deposition: Application to Chamber Design and Process Control.
- Publish Info
- [S.l.] : University of California, Los Angeles., 2021
- Publish Info
- Ann Arbor : ProQuest Dissertations & Theses, 2021
- Material Info
- 152 p.
- General Note
- Source: Dissertations Abstracts International, Volume: 82-12, Section: B.
- General Note
- Advisor: Christofides, Panagiotis D.
- 학위논문주기
- Thesis (Ph.D.)--University of California, Los Angeles, 2021.
- Restrictions on Access Note
- This item must not be sold to any third party vendors.
- Subject Added Entry-Topical Term
- Chemical engineering.
- Subject Added Entry-Topical Term
- Fluid mechanics.
- Index Term-Uncontrolled
- Atomic layer deposition
- Index Term-Uncontrolled
- Computational fluid dynamics
- Index Term-Uncontrolled
- Control
- Index Term-Uncontrolled
- Kinetic Monte Carlo
- Index Term-Uncontrolled
- Machine learning
- Index Term-Uncontrolled
- Plasma enhanced atomic layer deposition
- Added Entry-Corporate Name
- University of California, Los Angeles Chemical Engineering 0294
- Host Item Entry
- Dissertations Abstracts International. 82-12B.
- Host Item Entry
- Dissertation Abstract International
- Electronic Location and Access
- 로그인을 한후 보실 수 있는 자료입니다.
- 소장사항
-
202202 2022
- Control Number
- joongbu:612839
Detail Info.
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