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Non-stoichiometric AlOx Films Prepared by Chemical Vapor Deposition Using Dimethylaluminum Isopropoxide as Single Precursor and Their Non-volatile Memory Characteristics
Non-stoichiometric AlOx Films Prepared by Chemical Vapor Deposition Using Dimethylaluminum Isopropoxide as Single Precursor and Their Non-volatile Memory Characteristics
- Material Type
- 기사
- ISSN
- 02532964
- Callnumber
- 540 화92b v.33-7
- Title/Author
- Non-stoichiometric AlO<SUB>x</SUB> Films Prepared by Chemical Vapor Deposition Using Dimethylaluminum Isopropoxide as Single Precursor and Their Non-volatile Memory Characteristics / 이선숙 ; 이은석 ; 김석환 ; 이병국 ; 정석정 ; 황진하 ; 김창균 ; 정택모 ; 안기석 공 저
- Publish Info
- 서울 : 대한화학회, 2012.
- Material Info
- pp. 2207-2212
- Added Entry-Personal Name
- 이선숙
- Added Entry-Personal Name
- 이은석
- Added Entry-Personal Name
- 김석환
- Added Entry-Personal Name
- 이병국
- Added Entry-Personal Name
- 정석정
- Added Entry-Personal Name
- 황진하
- Added Entry-Personal Name
- 김창균
- Added Entry-Personal Name
- 정택모
- Added Entry-Personal Name
- 안기석
- Host Item Entry
- Bulletin of the Korean chemical society : VOL33 NO7 2012, 07
- 모체레코드
- 모체정보확인
- Control Number
- joongbu:405596
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